![]() C23C14/354- Introduction of auxiliary energy into the plasma.C23C14/35- Sputtering by application of a magnetic field, e.g.C23C14/22- Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating.C23C14/00- Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material.C23C- COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL.C23- COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMICAL SURFACE TREATMENT DIFFUSION TREATMENT OF METALLIC MATERIAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL.Assignors: BROWN, KARL M, MEHTA, VINEET, PIPITONE, JOHN Application granted granted Critical Publication of US8562798B2 publication Critical patent/US8562798B2/en Status Active legal-status Critical Current Adjusted expiration legal-status Critical Links ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.) Filing date Publication date Priority claimed from US11/052,011 external-priority patent/US7399943B2/en Application filed by Applied Materials Inc filed Critical Applied Materials Inc Priority to US11/222,231 priority Critical patent/US8562798B2/en Publication of US20060169582A1 publication Critical patent/US20060169582A1/en Assigned to APPLIED MATERIALS, INC. Original Assignee Applied Materials Inc Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.) ( en Inventor Karl Brown John Pipitone Vineet Mehta Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.) Granted Application number US11/222,231 Other versions US8562798B2 Google Patents Physical vapor deposition plasma reactor with RF source power applied to the target and having a magnetronÄownload PDF Info Publication number US20060169582A1 US20060169582A1 US11/222,231 US22223105A US2006169582A1 US 20060169582 A1 US20060169582 A1 US 20060169582A1 US 22223105 A US22223105 A US 22223105A US 2006169582 A1 US2006169582 A1 US 2006169582A1 Authority US United States Prior art keywords reactor target vhf copper metal Prior art date Legal status (The legal status is an assumption and is not a legal conclusion. Google Patents US20060169582A1 - Physical vapor deposition plasma reactor with RF source power applied to the target and having a magnetron US20060169582A1 - Physical vapor deposition plasma reactor with RF source power applied to the target and having a magnetron
0 Comments
Leave a Reply. |
AuthorWrite something about yourself. No need to be fancy, just an overview. ArchivesCategories |